Influence of B2H6/CH4 and B(CH3)3 as process gas on boron carbide coatings: an in situ photoelectron spectroscopy study

Autor: Peter Oelhafen, Roland Steiner, P. Gantenbein, H. Künzli
Rok vydání: 1992
Předmět:
Zdroj: Journal of Nuclear Materials. :622-626
ISSN: 0022-3115
DOI: 10.1016/s0022-3115(06)80111-x
Popis: We have performed in situ photoelectron spectroscopy measurements (XPS, UPS) and ex situ characterization techniques (AES depth profiling, SEM, α-step) on BC coatings prepared by radiofrequency PACVD method using different mixtures of diborane and methane, as well as trimethylboron. The deposition has been made on Si substrates at room temperature. The coatings were hard and did not peel off after exposure to air. The compositions of the coatings, deposited with diborane and methane are correlated to the mixture of the process gas. Additionally we found oxygen contaminations (up to 5 at%) in the films, which are not incorporated in the form of boron oxide (B 2 O 3 ). Using trimethylboron as process gas we prepared films with an oxygen level below 0.5 at%. These coatings are slightly boron enriched as compared to the gas phase stoichiometry.
Databáze: OpenAIRE