Dry Development Rinse Process (DDRP) & Materials (DDRM) For EUVL

Autor:	Ryuji Onishi, Shibayama Wataru, Makoto Nakajima, Shigaki Shuhei, Satoshi Takeda, Rikimaru Sakamoto
Rok vydání:	2016
Předmět:	010302 applied physics 010309 optics Materials science Polymers and Plastics Extreme ultraviolet lithography Scientific method 0103 physical sciences Organic Chemistry Materials Chemistry Nanotechnology 01 natural sciences
Zdroj:	Journal of Photopolymer Science and Technology. 29:469-474
ISSN:	1349-6336 0914-9244
DOI:	10.2494/photopolymer.29.469
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::3a16ef7cda9ddd227d19851ed0b30896 https://doi.org/10.2494/photopolymer.29.469 Zobrazit plný text záznamu