Quantitative Analysis of Phosphorus and Arsenic in Silcon by means of Ion Microanalyzer

Autor:	Norikazu Hashimoto, Hitoshi Tsuyama
Rok vydání:	1977
Předmět:	inorganic chemicals Silicon Chemistry Hydride Phosphorus Inorganic chemistry Analytical chemistry chemistry.chemical_element engineering.material Ion Polycrystalline silicon engineering Wafer Quantitative analysis (chemistry) Arsenic
Zdroj:	Journal of the Mass Spectrometry Society of Japan. 25:351-362
ISSN:	1884-3271 1340-8097
DOI:	10.5702/massspec1953.25.351
Popis:	Experimental study on the analysis of phosphorus and arsenic in silicon has beencarried out with Hitachi IMA-2type ion microanalyzer. It was found that the interfere of 30SiH+ and 29Si30SiO+ peaks were important problem for the analysis. The anal ytical conditions which minimize the production of silicon hydride ions have been studied. The intensity ratio31P+/28Si+on Si wafers(1017-1019 P atoms/cm3)was not propo rtional to the phosphorus concentration determined by wet chemical analysis. But in high concentration range, a normal caribration curve was obtained for P in Phospho silicate glasses with 0.5-7P2O5 mol %. The intensity ratio75As+/28Si on Si wafers(1016-1020As atoms/cm3)was not proportional to the arsenic concentration determined from the electric resistivities. But at higher concentration than 1020 atoms/cm, the intensity ratio for polycrystalline silicon films was proportional to the arsenic concentration determined by activation analysis. The minimum detectable limit of phosphorus and arsenic in silicon have been esti mated to be nearly 1017-1018 atoms/cm3.
Databáze:	OpenAIRE
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