Line end shortening in CPL mask technology
| Autor: | Wei Wu, Kevin Lucas, Pat Cook, Stephen Hsu, Doug Van Den Broeke, Chris Progler, Robert John Socha, Will Conley, Stefan van de Goor, Erika Schaefer, Arjan Verhappen, Kurt E. Wampler, Bernie Roman, Thomas Laidig, Bryan S. Kasprowicz, Jan Pieter Kuijten, Lloyd C. Litt |
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| Rok vydání: | 2005 |
| Předmět: |
Computer science
business.industry Process (computing) Hybrid type Window (computing) Photoresist Condensed Matter Physics Atomic and Molecular Physics and Optics Surfaces Coatings and Films Electronic Optical and Magnetic Materials Optics Line (geometry) Process window Electrical and Electronic Engineering Focus (optics) business |
| Zdroj: | Microelectronic Engineering. :393-397 |
| ISSN: | 0167-9317 |
| Popis: | Various types of line ends have been evaluated for either straight CPL mask or hybrid type builds. The authors will focus on image line end shortening and the impact of through dose and focus performance for very high NA ArF imaging. Simulations on test structures have been calculated along with in photoresist simulations to predict the impact on process window capability. Test structures have been designed and fabricated into a functional test for evaluation. Process evaluations have been completed and exposure-defocus window calculated. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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