Simulation of projection optic lithography images with finite impulse response filters

Autor: L. K. White, J. R. Matey
Rok vydání: 1992
Předmět:
Zdroj: Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 10:3019
ISSN: 0734-211X
DOI: 10.1116/1.585963
Popis: Finite impulse response (FIR) filters are used to simulate projection optic lithography images. For large arbitrary arrays of imaging data, the FIR filter simulation approach has advantages that lead to dramatic improvements in computation times. The transmission cross‐coefficient (TCC) transfer function is more easily computed, the forward and reverse complex Fourier transforms need not be computed, and, foremost, the application of the TCC can be greatly simplified. Comparisons between FIR and Fourier transform simulation methods for one‐dimensional objects in many cases show excellent agreement to within 1% of the total illumination intensity. The computation of projection optic images for 1000×1000 pixel arrays objects in real time (≤30 ms) appears possible using massively parallel, single‐instruction multiple data computers. This capability provides a powerful design, layout, and design rule checking tool for phase‐shift masks.
Databáze: OpenAIRE