Development and Applications of a Compact Electron Cyclotron Resonance Source

Autor:	Shoji Den, Patrick O'keeffe, Shuji Komuro, Yoshinobu Aoyagi, Takitaro Morikawa
Rok vydání:	1991
Předmět:	Passivation Chemistry Etching (microfabrication) Radical General Engineering Analytical chemistry General Physics and Astronomy Deposition (phase transition) Substrate (electronics) Irradiation Plasma Electron cyclotron resonance
Zdroj:	Japanese Journal of Applied Physics. 30:3164
ISSN:	1347-4065 0021-4922
Popis:	A new compact ECR plasma source has been developed. The characteristics of this source and it's applications are discussed. Irradiation by oxygen radicals O* for the oxidation during deposition process was found to produce high quality superconducting thin films with increased characteristic temperatures. Hydrogen radical H* beam cleaning of GaAs substrate surfaces was achieved at temperatures as low as 100°C.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::38e72814a32e8e961d735f6b4014b764 https://doi.org/10.1143/jjap.30.3164 Zobrazit plný text záznamu