Ungated Vacuum Field Emission from Ordered Arrays of Microlithographically Defined Cylinders

Autor:	Douglas A. Kirkpatrick, James J. Hickman, M. Anderson, J. H. Georger, G. L. Bergeron
Rok vydání:	1992
Předmět:	Auger electron spectroscopy Materials science business.industry Scanning electron microscope Electron Cathode law.invention Field electron emission X-ray photoelectron spectroscopy Resist law Optoelectronics Microelectronics business
Zdroj:	MRS Proceedings. 260
ISSN:	1946-4274 0272-9172
DOI:	10.1557/proc-260-423
Popis:	A new process has been developed which allows electroless metal deposition on ordered arrays of resist structures with high aspect ratios (10–25 μm tall x 0.5–13 μm diameter). The fabricated structures have demonstrated ungated vacuum field emission at fields of 80–300 kV/cm in background pressures of 5 × 10-6 torr. The surface composition and Interface contamination relate directly to cathode performance. Cathode performance can be optimized by controlling the chemistry at these interfaces. X-ray Photoelectron Spectroscopy depth profiles, Scanning Auger Electron Spectroscopy, and Scanning Electron Microscopy have been used to characterize this system. These structures have potential vacuum microelectronics applications such as addressable electron emitters for flat panel displays.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::38dc49ce5edc829343ce06f07c74aa55 https://doi.org/10.1557/proc-260-423 Zobrazit plný text záznamu Full text from SpringerLink