Photoresist characteristics of polyurea films prepared by vapor deposition polymerization Depolymerization of polyurea
| Autor: | Yoshikazu Takahashi, Masayuki Iijima, Sato Masatoshi |
|---|---|
| Rok vydání: | 1996 |
| Předmět: |
Depolymerization
Thermal resistance Side reaction General Physics and Astronomy Surfaces and Interfaces General Chemistry Chemical vapor deposition Photoresist Condensed Matter Physics Surfaces Coatings and Films law.invention chemistry.chemical_compound chemistry Chemical engineering law Polymer chemistry Vapor deposition polymerization Photolithography Polyurea |
| Zdroj: | Applied Surface Science. :120-123 |
| ISSN: | 0169-4332 |
| Popis: | Aromatic polyurea was prepared by vapor deposition polymerization of 4, 4′-diaminodiphenyl methane and 4, 4′-diphenylmethane diisocyanate. Mass spectrometric analysis revealed depolymerization of the polyurea. The polyurea evaporated completely at 300°C or lower in vacuum. UV exposed polyurea did not evaporate even at temperatures greater than 300°C. To exploit the thermal resistance of the exposed and unexposed polyurea, patterned films were prepared with 5 μm resolution. It was found that the polyurea could be used as a negative resist material, and that an all-dry lithographic process was possible. |
| Databáze: | OpenAIRE |
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