Nanoparticle Photoresists: Ligand Exchange as a New, Sensitive EUV Patterning Mechanism

Autor:	Sovik Chakrabarty, Marie Kryask, Christine Y. Ouyang, Markos Trikeriotis, Emmanuel P. Giannelis, Christopher K. Ober
Rok vydání:	2013
Předmět:	Materials science ComputerSystemsOrganization_COMPUTERSYSTEMIMPLEMENTATION Polymers and Plastics Extreme ultraviolet lithography Nanoscale Science Organic Chemistry Materials Chemistry Nanoparticle Nanotechnology
Zdroj:	Journal of Photopolymer Science and Technology. 26:659-664
ISSN:	1349-6336 0914-9244
Popis:	The authors gratefully acknowledge International SEMATECH for funding, as well as the Cornell Nanoscale Science and Technology Facility (CNF), Cornell Center of Materials Research (CCMR), the Nanobiotechnology Center (NBTC) and the KAUST-Cornell Center of Energy and Sustainability (KAUST-CU) for use of their facilities.Lawrence Berkeley National Laboratories was essential in our studies of EUV exposure.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::38c81474ccd80bb0894bc60cacfdf73c https://doi.org/10.2494/photopolymer.26.659 Zobrazit plný text záznamu