Nanoparticle Photoresists: Ligand Exchange as a New, Sensitive EUV Patterning Mechanism
Autor: | Sovik Chakrabarty, Marie Kryask, Christine Y. Ouyang, Markos Trikeriotis, Emmanuel P. Giannelis, Christopher K. Ober |
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Rok vydání: | 2013 |
Předmět: | |
Zdroj: | Journal of Photopolymer Science and Technology. 26:659-664 |
ISSN: | 1349-6336 0914-9244 |
Popis: | The authors gratefully acknowledge International SEMATECH for funding, as well as the Cornell Nanoscale Science and Technology Facility (CNF), Cornell Center of Materials Research (CCMR), the Nanobiotechnology Center (NBTC) and the KAUST-Cornell Center of Energy and Sustainability (KAUST-CU) for use of their facilities.Lawrence Berkeley National Laboratories was essential in our studies of EUV exposure. |
Databáze: | OpenAIRE |
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