Numerical Simulation: Effects of Gas Flow and Rf Current Direction on Plasma Uniformity in an ICP Dry Etcher
| Autor: | Junghoon Joo |
|---|---|
| Rok vydání: | 2017 |
| Předmět: |
010302 applied physics
Materials science Computer simulation business.industry Materials Science (miscellaneous) Flow (psychology) 02 engineering and technology General Medicine Plasma 021001 nanoscience & nanotechnology Condensed Matter Physics 01 natural sciences Etching 0103 physical sciences Optoelectronics Electrical and Electronic Engineering Physical and Theoretical Chemistry Current (fluid) 0210 nano-technology business |
| Zdroj: | Applied Science and Convergence Technology. 26:189-194 |
| ISSN: | 2288-6559 |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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