The Use of Silicon Dioxide Films as Anti-Reflective Coating of Thermoelectric Single-Photon Detector
| Autor: | S. I. Petrosyan, G. R. Badalyan, Armen S. Kuzanyan, A. A. Kuzanyan |
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| Rok vydání: | 2020 |
| Předmět: |
Materials science
Silicon dioxide business.industry 010401 analytical chemistry Photon detector General Physics and Astronomy 02 engineering and technology Radiation 021001 nanoscience & nanotechnology Microstructure 01 natural sciences 0104 chemical sciences law.invention chemistry.chemical_compound Anti-reflective coating chemistry law Sputtering Thermoelectric effect Surface roughness Optoelectronics 0210 nano-technology business |
| Zdroj: | Journal of Contemporary Physics (Armenian Academy of Sciences). 55:365-370 |
| ISSN: | 1934-9378 1068-3372 |
| DOI: | 10.3103/s1068337220040106 |
| Popis: | Antireflection layers are an important part of the sensitive elements of high performance single photon detectors. We have obtained amorphous silicon dioxide films by electron-beam sputtering on Al2O3, AlN, Si substrates as well as CeB6, LaB6, and W coatings. The elemental composition, microstructure and surface roughness, as well as optical characteristics of the samples obtained under various conditions of spraying are investigated. It is shown that SiO2/Al2O3 and SiO2/AlN two-layer coatings can provide high detection efficiency under registration of the radiation in the near IR region, which is used in telecommunication systems and devices for quantum information processing. |
| Databáze: | OpenAIRE |
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