Synthesis of carbon films by magnetron sputtering of a graphite target using hydrogen as plasma-forming gas

Autor:	N. N. Melnik, Vitali I. Konov, V. V. Sychev, D. V. Vlasov, A. N. Yurkov, V. V. Savranskii
Rok vydání:	2011
Předmět:	Hydrogen Graphene chemistry.chemical_element Sputter deposition Electronic Optical and Magnetic Materials law.invention Carbon film Chemical engineering chemistry law Graphite Thin film Forming gas Carbon
Zdroj:	Bulletin of the Lebedev Physics Institute. 38:263-266
ISSN:	1934-838X 1068-3356
Popis:	During magnetron sputtering of graphite using hydrogen as plasma-forming gas, a material sputtered from the target deposited only on heated substrates. When using currentheated Ni-Fe foils as substrates, carbon deposits of different crystal structures were obtained. The conditions for growing single-crystal graphite layers and single- and multilayer graphenes are found by analyzing deposits by Raman scattering.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::384ceedff2284d713dcb53b897bdb4d4 https://doi.org/10.3103/s106833561109003x Zobrazit plný text záznamu Full text from SpringerLink