Co-containing Ferrite Thin-Film Disk Prepared by Reactive Sputtering Method
| Autor: | Takanori Doi, Setsuo Yamamoto, Kousaku Tamari, Kei Hirata, Mitsuru Matsuura, Hiroki Kurisu |
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| Rok vydání: | 2001 |
| Předmět: |
Materials science
Perpendicular magnetic anisotropy Mechanical Engineering Metals and Alloys Coercivity Industrial and Manufacturing Engineering Ion source Magnetic field Condensed Matter::Materials Science Nuclear magnetic resonance Sputtering Physics::Space Physics Materials Chemistry Perpendicular Ferrite (magnet) Physics::Chemical Physics Thin film Composite material |
| Zdroj: | Journal of the Japan Society of Powder and Powder Metallurgy. 48:742-747 |
| ISSN: | 1880-9014 0532-8799 |
| Popis: | Reactive sputtering using an Electron-Cyclotron-Resonance microwave plasma was introduced to prepare Co containing ferrite thin-film media at substrate temperatures lower than 150°C without post oxidation process. The ferrite thin-films deposited on glass substrate had a perpendicular magnetic anisotropy, high coercivity of about 240 kA/m and very smooth surface. The ferrite thin-film media annealed in magnetic field showed a large perpendicular magnetic anisotropy, perpendicular coercivity of 258 kA/m and perpendicular loop with the high squareness of 0.82. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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