Structure and Properties of Zrtio4 Thin Films Prepared by Reactive Magnetron Co-Sputtering Without Heating

Autor:	Nirun Witit-Anun, Alongkot Treetong, Pichet Limsuwan, Surasing Chaiyakun, Jindawan Thammapreecha, Bundit Putasaeng
Rok vydání:	2017
Předmět:	Materials science Sputtering law Cavity magnetron Analytical chemistry Orthorhombic crystal system Dielectric Thin film Crystallization Refractive index High-κ dielectric law.invention
Zdroj:	International Journal of Natural Sciences Research. 5:50-54
ISSN:	2311-4746 2311-7435
DOI:	10.18488/journal.63.2017.53.50.54
Popis:	ZrTiO4 thin films were deposited by reactive dc magnetron co-sputtering method without heating. The crystal structure, surface morphology, thickness, optical and dielectric properties of the thin films were investigated. At sputtering currents above 2.0 A without heating ZrTiO4 thin film was crystallization of the orthorhombic phase (111). The values of refractive index were ranged between 2.01 and 2.23 (at 650 nm). The optical packing density values were ranged between 0.85 and 0.96. From this study, it was observed that the refractive index values were strongly dependent on packing densities. The high dielectric constant width decreases from 74.3 to 43.3 when sputtering current increases, which is higher than other research.
Databáze:	OpenAIRE
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