| Autor: |
C. T. Wan, D. C. Carmichael, D. L. Chambers |
| Rok vydání: |
1971 |
| Předmět: |
|
| Zdroj: |
Journal of Vacuum Science and Technology. 8:VM99-VM104 |
| ISSN: |
0022-5355 |
| DOI: |
10.1116/1.1315418 |
| Popis: |
The ion plating process has been generally limited to low-melting materials in past coating applications. In this study, several electron-beam melting techniques have been investigated which provide methods for melting various high-melting-point materials within a glow discharge atmosphere. The magnetically focused hot-filament and the cold-hollow-cathode electron sources have been experimentally studied to evaluate their operational and evaporation-deposition characteristics for the ion plating process. The hollow-cathode electron source emits an intense electron beam and is capable of delivering very high beam power. The gun is made of high melting-point sheets or screens formed into a hollow cylinder or sphere having an aperture to allow the emittance of electrons. It operates in an inert-gas, glow discharge environment such as that of ion plating. Gas pressure is a key processing variable in controlling the mode of operation; the hot-cathode mode operates at high pressures with excellent stability and... |
| Databáze: |
OpenAIRE |
| Externí odkaz: |
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