Metrology Requirements for the 32 nm Technology Node and Beyond
| Autor: | Doron Arazi, Aaron Cordes, Pete Lipscomb, Kye-Weon Kim, Victor Vartanian, Milt Godwin, Benjamin Bunday, John Allgair, Michael Bishop |
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| Rok vydání: | 2009 |
| Předmět: | |
| Zdroj: | ECS Transactions. 18:151-160 |
| ISSN: | 1938-6737 1938-5862 |
| DOI: | 10.1149/1.3096443 |
| Popis: | Successful in-line metrology is imperative for a fab to achieve profitable production yields. Full functionality and high circuit speed are achieved only through control of defectivity and tight distributions of feature sizes. In-line monitoring of applicable metrics is key to ensuring success and is also used to fine-tune production processes for improved yield and circuit speed. Metrology has now become an inherent part of mission-critical production processes. This article gives a high-level overview of the findings of the ISMI metrology program and details some of the major approaching manufacturing challenges. |
| Databáze: | OpenAIRE |
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