Gas Response of SILAR Fabricated Zinc Oxide Thin Film to Ammonia and Methane Gas at Room Temperature
| Autor: | Christopher T. Estandarte, Emmanuel A. Florido |
|---|---|
| Rok vydání: | 2020 |
| Předmět: |
010302 applied physics
Ammonia gas Materials science Inorganic chemistry Ionic bonding 02 engineering and technology 021001 nanoscience & nanotechnology Zinc oxide thin films 01 natural sciences Methane Ammonia chemistry.chemical_compound chemistry 0103 physical sciences Thin film 0210 nano-technology Layer (electronics) Methane gas |
| Zdroj: | Materials Today: Proceedings. 23:666-673 |
| ISSN: | 2214-7853 |
| Popis: | The study aimed to determine the gas response of unsensitized, Pd-sensitized, Mn-sensitized ZnO thin films to ammonia and methane gas. The films are successfully fabricated using Successive Ionic Layer Adsorption Reaction (SILAR) method. One of the films is left unsensitized and the other two were sensitized with 0.01M of Pd and Mn via dipping technique. Each film was exposed to ammonia (NH3) and methane (CH4) with concentrations of 667pm, 1333ppm and 2000 ppm. The sensitivity of the unsensitized film to methane gas was 2.46 10 , 000 p p m while its sensitivity to ammonia gas was 0.49 10 , 000 p p m . Results show that the unsensitized film was more sensitive to methane compared to ammonia gas |
| Databáze: | OpenAIRE |
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