CPI challenges in advanced Si technology nodes

Autor: M. J. Lii, C. S. Liu, Hao-Yi Tsai, C. H. Lee, Doug C. H. Yu, Ching-Fang Chen, H. P. Pu
Rok vydání: 2013
Předmět:
Zdroj: 2013 IEEE International Interconnect Technology Conference - IITC.
Popis: The key chip-package-integration (CPI) challenges and solutions in the packaging and assembly of advanced Si technology nodes are reported. The key challenge of CPI due to the use of fragile extreme low-k (ELK) dielectric materials in the back-end-of-line (BEOL) layer has been resolved by optimizing bump structure and materials set including both the organic substrate and solder materials, along with process improvements for both Pb-free solder and Cu bump in flip chip packages.
Databáze: OpenAIRE