Fabrication of nanometer-structures for photonic devices based on the negative tone resist AZPN114
| Autor: | A. Menschig, H.-P. Gauggel, H.J. Brückner, R. Zengerle, H. Gräbeldinger, A. Hase, V. Hofsäβ, Heinz Schweizer, C. Kaden |
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| Rok vydání: | 1994 |
| Předmět: |
Coupling
Fabrication Materials science business.industry Grating Condensed Matter Physics Laser Atomic and Molecular Physics and Optics Surfaces Coatings and Films Electronic Optical and Magnetic Materials law.invention Ion implantation Optics Resist law Optoelectronics Substructure Electrical and Electronic Engineering Photonics business |
| Zdroj: | Microelectronic Engineering. 23:469-472 |
| ISSN: | 0167-9317 |
| Popis: | The high contrast resist AZPN114 has been investigated with respect to its suitability for realizing optically active and passive structures. Two devices with completely different size and shape in their substructure were fabricated avoiding any complex proximity corrections. So narrow-band waveguide grating couplers were realized in a single exposure step. For the realization of gain coupled distributed feed back (DBF)- lasers gold masks with a width of 160 nm and a grating period of 200 nm were fabricated. The gain coupling was achieved with the technique of ion implantation induced intermixing. |
| Databáze: | OpenAIRE |
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