Effect of Atomic Hydrogen in SiNx Films for Gate Dielectric of Silicon-Based TFTs Fabricated at a Low-Temperature({less than or equal to} 150 °) by Cat-CVD
| Autor: | Ki-Su Keum, Kyoung-Min Lee, Jae-Dam Hwang, Kil-Sun No, Wan-Shick Hong |
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| Rok vydání: | 2011 |
| Zdroj: | ECS Meeting Abstracts. :62-62 |
| ISSN: | 2151-2043 |
| DOI: | 10.1149/ma2011-01/2/62 |
| Popis: | not Available. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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