Massive transfer of vertically aligned Si nanowire array onto alien substrates and their characteristics
Autor: | Ching-Fuh Lin, Jiun-Jie Chao, Shu-Chia Shiu, Shih-Che Hung |
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Rok vydání: | 2009 |
Předmět: |
Materials science
Silicon business.industry Nanowire General Physics and Astronomy chemistry.chemical_element Surfaces and Interfaces General Chemistry Photovoltaic effect Condensed Matter Physics Flexible electronics Semimetal Surfaces Coatings and Films chemistry Attenuation coefficient Transmittance Optoelectronics Absorption (electromagnetic radiation) business |
Zdroj: | Applied Surface Science. 255:8566-8570 |
ISSN: | 0169-4332 |
DOI: | 10.1016/j.apsusc.2009.06.021 |
Popis: | Si nanowires (NWs) are promising materials for future electronic, photovoltaic, and sensor applications. So far the Si NWs are mainly formed on particular substrates or at high temperatures, greatly limiting their application flexibility. Here we report a low temperature process for forming and massively transferring vertically aligned Si NWs on alien substrates with a large density of about (3–5) × 10 7 NWs/mm 2 . The X-ray diffraction spectrum reveals that the transferred NWs exhibit almost the same crystal property as the bulk Si. Our investigation further shows that the transferred NWs have exceptional optical characteristics. The transferred Si NWs of 12.14 μm exhibit the transmittance as low as 0.3% in the near infrared region and 0.07% in the visible region. The extracted absorption coefficient of Si NWs in the near infrared region is about 3 × 10 3 cm −1 , over 30 times larger than that of the bulk Si. Because of the low temperature process, it enables a large variety of alien substrates such as glass and plastics to be used. In addition, the exceptional properties of the transferred NWs offer potential applications for photovoltaic, photo-detectors, sensors, and flexible electronics. |
Databáze: | OpenAIRE |
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