Autor: |
David P. Vallett, Frank Altmann, Christian Schmidt |
Rok vydání: |
2012 |
Předmět: |
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Zdroj: |
International Symposium for Testing and Failure Analysis. |
ISSN: |
0890-1740 |
DOI: |
10.31399/asm.cp.istfa2012p0088 |
Popis: |
Lock-in thermography and magnetic current imaging are emerging as the two image-based fault isolation methods most capable of meeting the challenges of short and open defect localization in thick, opaque assemblies. Such devices are rapidly becoming prevalent as 3D integration begins to ramp up production. This paper expands on previously published work with a qualitative comparison of the techniques on single chip and stacked die packages with known designed-in or FIB created defects. |
Databáze: |
OpenAIRE |
Externí odkaz: |
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