Structural characterization of NiO films on Al2O3(0001)

Autor:	M. Noblet, Yves Samson, C Mocuta, Antoine Barbier, G Renaud
Rok vydání:	2000
Předmět:	Diffraction Materials science Low-energy electron diffraction business.industry Non-blocking I/O Crystal structure Cubic crystal system Condensed Matter Physics Epitaxy Electronic Optical and Magnetic Materials Crystallography Optics Thin film business Molecular beam epitaxy
Zdroj:	Journal of Magnetism and Magnetic Materials. 211:283-290
ISSN:	0304-8853
Popis:	NiO films on clean α-Al2O3(0 0 0 1) were prepared by molecular beam epitaxy. Two parameters were considered: the growth temperature (320–700°C) and the film thickness (29–200 nm). Low energy electron diffraction (LEED) patterns of the deposits show a six-fold symmetry. The samples were ex situ characterized by atomic force microscopy (AFM) and by grazing incidence X-ray diffraction. For all samples, NiO islands with different sizes and shapes were observed. A layer of pyramidal NiO islands, with triangular facets is present. Depending on the sample, also hexagonal or square islands were observed. The angles of the triangular facets correspond to (1 0 0) surfaces of the NiO(1 1 1). X-ray diffraction evidences that the NiO film grows with the (1 1 1) plane parallel to the (0 0 0 1)Al2O3 one. Twinned and not-twinned face centered cubic (FCC) NiO(1 1 1) stacking are present in approximately equal quantities. The crystallographic quality of the NiO layers was investigated.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::368d3a2babf68e4bca75c24cdca334a9 https://doi.org/10.1016/s0304-8853(99)00748-9 Zobrazit plný text záznamu Full Text from ScienceDirect