Electron-beam exposure characteristics of a novel Ru-PMMA composite resist
| Autor: | Michael D. R. Thomas, D. B. Brown, Haroon Ahmed, David G. Hasko, Brian F. G. Johnson |
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| Rok vydání: | 1998 |
| Předmět: |
Nanocomposite
Materials science Composite number chemistry.chemical_element Condensed Matter Physics Atomic and Molecular Physics and Optics Surfaces Coatings and Films Electronic Optical and Magnetic Materials Ruthenium chemistry Resist Cathode ray Dry etching Electrical and Electronic Engineering Reactive-ion etching Composite material Electron-beam lithography |
| Zdroj: | Microelectronic Engineering. :327-330 |
| ISSN: | 0167-9317 |
| DOI: | 10.1016/s0167-9317(98)00075-6 |
| Popis: | The properties of a nanocomposite resist formed by the addition of ruthenium metal clusters, [Ru11H(CO)27]3−, to PMMA has been investigated. Depending on the amount added, the nanocomposite resist displayed a reduction in rate of dry etching of between 20% and 55%. The sensitivity of the resist was found to be 7 C/m2. Contrast was not affected. Gratings of 80 nm pitch have been fabricated. |
| Databáze: | OpenAIRE |
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