Analytical expression for ion-implanted impurity concentration profiles

Autor:	Kunihiro Suzuki, Ritsuo Sudo
Rok vydání:	2000
Předmět:	Materials science Impurity Materials Chemistry Analytical chemistry food and beverages Function (mathematics) Electrical and Electronic Engineering Condensed Matter Physics Molecular physics Computer Science::Databases Expression (mathematics) Electronic Optical and Magnetic Materials Ion
Zdroj:	Solid-State Electronics. 44:2253-2257
ISSN:	0038-1101
DOI:	10.1016/s0038-1101(00)00219-7
Popis:	By expanding our previously proposed analytical expression for dose-dependent ion-implanted impurity concentration profiles using a main function and a tail function, we improve the model so that the parameters can be extracted more robustly and extend the model to accommodate double-peak profiles. The shape of our new profile model can be imaged more clearly from a set of parameters.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::3647c795e7f6d86337960ea34df2cd8c https://doi.org/10.1016/s0038-1101(00)00219-7 Zobrazit plný text záznamu Full Text from ScienceDirect