Advanced lithography for ULSI
| Autor: | William G. Oldham, Andrew R. Neureuther, Jeffrey Bokor |
|---|---|
| Rok vydání: | 1996 |
| Předmět: |
Physics
Computational lithography business.industry Extreme ultraviolet lithography Electronic Optical and Magnetic Materials law.invention Lens (optics) Optics law X-ray lithography Electrical and Electronic Engineering Stepper Photolithography business Instrumentation Lithography Next-generation lithography |
| Zdroj: | IEEE Circuits and Devices Magazine. 12:11-15 |
| ISSN: | 8755-3996 |
| DOI: | 10.1109/101.481203 |
| Popis: | Lens technology has advanced to the point where lithographic feature sizes equal to, or even smaller than, the wavelength of the light used in the stepper can be achieved in production. How far optical lithography can go from here depends both on how short a wavelength is possible and how close we can come to the absolute limit of diffraction. In this article, we will examine the current thinking on these questions, and discuss what might happen if and when optical lithography really can no longer be used. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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