Autor: |
M. Dutta, Kristina Driscoll, Theodore D. Moustakas, I. Friel, E. Kulenica, Roberto Paiella |
Rok vydání: |
2005 |
Předmět: |
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Zdroj: |
Journal of Crystal Growth. 278:387-392 |
ISSN: |
0022-0248 |
DOI: |
10.1016/j.jcrysgro.2005.01.042 |
Popis: |
AlN/GaN multiple quantum wells were grown by RF plasma-assisted molecular beam epitaxy on (0 0 0 1) sapphire substrates. Intersubband (ISB) absorption in the range of 1.5–1.9mm was investigated in these structures as a function of the main quantum well design parameters. It is found that the ISB transition line width does not depend strongly on the degree of strain relaxation in the investigated structures, but rather is sensitive to both the well and barrier widths. This is explained by considering well/barrier thickness fluctuations. A reduction in the ISB absorption line width was |
Databáze: |
OpenAIRE |
Externí odkaz: |
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