Nano-structure formed by nanosecond laser annealing on amorphous Si surface
| Autor: | D. Klinger, D. Żymierska, E. Łusakowska |
|---|---|
| Rok vydání: | 2006 |
| Předmět: |
Materials science
Reflection high-energy electron diffraction Silicon Excimer laser Annealing (metallurgy) business.industry Mechanical Engineering medicine.medical_treatment Analytical chemistry Physics::Optics chemistry.chemical_element Condensed Matter Physics Pulsed laser deposition Amorphous solid Condensed Matter::Materials Science chemistry Electron diffraction Mechanics of Materials medicine Optoelectronics General Materials Science Physics::Atomic Physics Crystallite business |
| Zdroj: | Materials Science in Semiconductor Processing. 9:323-326 |
| ISSN: | 1369-8001 |
| DOI: | 10.1016/j.mssp.2006.01.027 |
| Popis: | The formation of nano-structure on an amorphised Si surface is studied upon annealing by a nanosecond laser pulse of an excimer laser. The resulting structures are studied by means of the reflection high-energy electron diffraction technique and atomic force microscopy. Smoothing out of the post-implanted islands and then the formation of polycrystalline Si grains are observed in surfaces annealed with the energy density up to the threshold value. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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