Microstrip microwave induced plasma on a chip for atomic emission spectral analysis

Autor:	Volker Siemens, Nicolas H. Bings, José A. C. Broekaert
Rok vydání:	2005
Předmět:	Nuclear and High Energy Physics Materials science Argon Atomic emission spectroscopy chemistry.chemical_element Condensed Matter Physics Ion source Microstrip chemistry Plasma channel Plasma diagnostics Atomic physics Spectroscopy Plasma stability
Zdroj:	IEEE Transactions on Plasma Science. 33:560-561
ISSN:	0093-3813
DOI:	10.1109/tps.2005.844990
Popis:	A stable microstrip microwave plasma (MSP) operated at atmospheric pressure with a power of some 10-20 W and at a gas flow of 0.2-0.8 L/min of argon in a resonant structure produced with the aid of microstructuring technology on a 5/spl times/5 cm/sup 2/ quartz wafer provided with a 0.6-mm diameter plasma channel is described. The device is shown to be useful for the excitation of atomic and molecular species and for the atomic emission spectrometric determination of metals and of nonmetals in gases at the trace level, down to the ng/L-level, as shown for the case of sulfur.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::358c270390e75bbd26aa070537a31571 https://doi.org/10.1109/tps.2005.844990 Zobrazit plný text záznamu