Autor:	Pascal Le Floch, Anne-Marie Goncalves, Arnaud Etcheberry, Nicolas Mézailles, Charles Mathieu
Rok vydání:	2010
Předmět:	Materials science Passivation business.industry General Chemical Engineering General Chemistry Substrate (electronics) Semiconductor Chemical engineering X-ray photoelectron spectroscopy Monolayer Materials Chemistry Photoelectrochemical process Thin film business Layer (electronics)
Zdroj:	Chemistry of Materials. 22:3114-3120
ISSN:	1520-5002 0897-4756
Popis:	A novel protective monolayer film on an n-InP semiconductor is obtained using a controlled photoelectrochemical process performed in liquid ammonia. Using a submillicoulombs per square centimeter spent charge and using a low current density (
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::352445b4f52edcd6cc518772066769f9 https://doi.org/10.1021/cm100035a Zobrazit plný text záznamu