AI-Based Image Processing for Photoresist Latent Image Enhancement : AM: Advanced Metrology

Autor:	Jiaxian Chen, Benyamin Davaji, Peter C. Doerschuk, Amit Lal, Cliff McCold, Ajit Paranjpe
Rok vydání:	2023
Zdroj:	2023 34th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC).
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::35177a60d190573181e1087f5a4da7ee https://doi.org/10.1109/asmc57536.2023.10121143 Zobrazit plný text záznamu