Large-area high-density plasma excitation using standing pure and hybrid surface waves
| Autor: | Hideo Sugai, S. Morita, Masaaki Nagatsu, I. Ghanashev |
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| Rok vydání: | 1998 |
| Předmět: | |
| Zdroj: | Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 16:1537-1541 |
| ISSN: | 1520-8559 0734-2101 |
| DOI: | 10.1116/1.581183 |
| Popis: | Plasma processing of large flat surfaces requires low pressure high density (ne=1011–1012 cm−3) plasmas with uniform plasma density distribution near to the processed surface. Microwave discharges may provide a valuable alternative to the inductively coupled plasmas applied widely now for this purpose. In a recent article [Jpn. J. Appl. Phys., Part 1 35, L341 (1996)] we proposed a plasma source in which the plasma is sustained by a standing surface wave propagating radially and azimuthally along the interface between the plasma and a dielectric plate located at the top wall of a large-diameter cylindrical metal chamber, the wave being launched by a pair of slot antennas cut in the top chamber wall above the dielectric plate. Here we present new experimental results at lower pressures (down to 3 mTorr) and in a non-noble reactive gas (CF4) demonstrating the applicability of the new source for dry etching. The electron density was about one order of magnitude lower than the one observed by previous experime... |
| Databáze: | OpenAIRE |
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