Effects of acid diffusion and resist molecular size on line edge roughness for chemically amplified resists in EUV lithography: computational study

Autor:	Masamitsu Shirai, Masanori Koyama, Kyohei Imai, Masaaki Yasuda, Yoshihiko Hirai
Rok vydání:	2021
Předmět:	Materials science Physics and Astronomy (miscellaneous) Molecular size Resist business.industry Extreme ultraviolet lithography General Engineering General Physics and Astronomy Optoelectronics Diffusion (business) business Line edge roughness
Zdroj:	Japanese Journal of Applied Physics. 60:106505
ISSN:	1347-4065 0021-4922
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::34534afc4aa33118e0794a91170731ce https://doi.org/10.35848/1347-4065/ac26e5 Zobrazit plný text záznamu