Application of taguchi’s design of experiments in optimization of metal assisted chemical etching process

Autor:	Saleem H. Zaidi, N. M. Nordin, Dewi Suriyani Che Halin, U. Hashim, Ayu Wazira Azhari
Rok vydání:	2019
Předmět:	Metal Taguchi methods Materials science business.industry Scientific method visual_art Design of experiments visual_art.visual_art_medium Process engineering business Isotropic etching
Zdroj:	IOP Conference Series: Materials Science and Engineering. 572:012059
ISSN:	1757-899X 1757-8981
DOI:	10.1088/1757-899x/572/1/012059
Popis:	In this study, statistical analysis using Taguchi’s method was used to investigate the effects of various process parameters involved in metal assisted chemical etching (MACE) of silicon. The process parameters that include etching time and various etchant concentration were selected and visualized in Taguchi modelling. Each sample was then characterized using the field emission scanning electron microscopy (FESEM). All data was then analysed and evaluated using ANOVA and graph modelling in order to visualize the interaction of each model. Results showed that for etching rate, separation and size of Si nanowires, the predicted model is in agreement with the experimental data with R2 of 0.94, 0.99 and 0.98 respectively.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::344f49935ae136eec92ff2edc71896ce https://doi.org/10.1088/1757-899x/572/1/012059 Zobrazit plný text záznamu