Plasma Oxidation Effects of Co-Containing Ferrite Thin Film Media Deposited by Reactive ECR Sputtering
| Autor: | Takanori Doi, Kei Hirata, Setsuo Yamamoto, Kousaku Tamari, Mitsuru Matsuura, Hirofumi Wada, Hiroki Kurisu |
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| Rok vydání: | 2002 |
| Předmět: |
Materials science
Plasma Condensed Matter Physics Electronic Optical and Magnetic Materials Smooth surface Chemical engineering Sputtering Oxygen plasma Thermal Ferrite thin films Ferrite (magnet) Electrical and Electronic Engineering Thin film Instrumentation hormones hormone substitutes and hormone antagonists |
| Zdroj: | Journal of the Magnetics Society of Japan. 26:263-268 |
| ISSN: | 0285-0192 |
| Popis: | The post-oxidation effects of reactive-ECR-sputtered Co-containing ferrite thin films are described, focusing on their morphology and their magnetic and recording properties. A combination of reactive-ECR-sputter deposition and post-oxidation with ECR oxygen plasma was proved to be the best method for preparing Co-containing ferrite thin film media with good magnetic properties, smooth surface, low medium-noise characteristics, excellent roll-off curve, and small thermal fluctuation. |
| Databáze: | OpenAIRE |
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