MOCVD Pd–Cu alloy films from single source heterometallic precursors
Autor: | Asiya E. Turgambaeva, Yury V. Shubin, Samara Urkasym kyzy, Sergey V. Sysoev, Natalya I. Petrova, Sergey V. Trubin, Evgene A. Maksimovskiy, Vladislav V. Krisyuk, Irina V. Mirzaeva, Tatyana P. Koretskaya |
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Rok vydání: | 2019 |
Předmět: |
010302 applied physics
Materials science Hydrogen Alloy chemistry.chemical_element 02 engineering and technology engineering.material 021001 nanoscience & nanotechnology Condensed Matter Physics 01 natural sciences Surfaces Coatings and Films Metal chemistry Chemical engineering visual_art 0103 physical sciences visual_art.visual_art_medium engineering Irradiation Metalorganic vapour phase epitaxy Total pressure 0210 nano-technology Instrumentation Chemical composition Deposition (law) |
Zdroj: | Vacuum. 166:248-254 |
ISSN: | 0042-207X |
DOI: | 10.1016/j.vacuum.2019.05.021 |
Popis: | An approach to MOCVD of Pd–Cu alloy films from volatile heterometallic single source precursors (SSP) is discussed. New SSPs are designed on the basis of metal β-diketonate complexes. Pd–Cu alloy films were prepared in cold wall reactor on Si and SiO2 substrates with hydrogen as gas-reagent, total pressure 10 Torr and deposition temperatures 250–400 °C, optionally with vacuum ultraviolet (VUV) irradiation. The detailed studies of thermal properties of the precursor vapor composition and Pd–Cu alloy films (composition, morphology) was performed by a set of experimental methods and DFT calculations. Comparison of fluorinated and non-fluorinated SSP showed how the modification of the monometallic constituents affects the thermal properties of the precursor and composition of the films. It was established that the ratio of metals in the film depends ultimately on the strength of binding between the monometallic subunits in the precursor, and then can be controlled by selecting the chemical composition of the precursor. |
Databáze: | OpenAIRE |
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