High resolution pattern-integrated interference lithography based on blazed grating

Autor:	陈林森 Chen Linsen, 浦东林 Pu Donglin, 董晓轩 Dong Xiao-Xuan, 胡进 Hu Jin, 申溯 Shen Su
Rok vydání:	2015
Předmět:	Materials science Optics law business.industry Blazed grating High resolution business Atomic and Molecular Physics and Optics Electronic Optical and Magnetic Materials law.invention Interference lithography
Zdroj:	Optics and Precision Engineering. 23:3335-3342
ISSN:	1004-924X
DOI:	10.3788/ope.20152312.3335
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::3407592a805c80a41f364db663250e2a https://doi.org/10.3788/ope.20152312.3335 Zobrazit plný text záznamu