Modeling and analysis of sulfur hexafluoride plasma etching for silicon microcavity resonators
| Autor: | Andreas Hössinger, Paul Manstetten, Michael Trupke, Frâncio Rodrigues, Ulrich Schmid, Georg Wachter, Josef Weinbub, Luiz Felipe Aguinsky |
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| Rok vydání: | 2021 |
| Předmět: |
Materials science
Plasma etching Silicon business.industry Mechanical Engineering chemistry.chemical_element Electronic Optical and Magnetic Materials Sulfur hexafluoride Resonator chemistry.chemical_compound chemistry Mechanics of Materials Optoelectronics Electrical and Electronic Engineering business |
| Zdroj: | Journal of Micromechanics and Microengineering. 31:125003 |
| ISSN: | 1361-6439 0960-1317 |
| DOI: | 10.1088/1361-6439/ac2bad |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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