Features of determination of thickness of dielectric films obtained in searching experiments

Autor:	B. M. Ayupov, V. R. Shayapov, Yu. M. Rumyantsev
Rok vydání:	2010
Předmět:	Materials science Silicon medicine.diagnostic_test Analytical chemistry chemistry.chemical_element Dielectric Silane Decomposition Surfaces Coatings and Films chemistry.chemical_compound chemistry Ellipsometry Spectrophotometry medicine Thin film Refractive index
Zdroj:	Journal of Surface Investigation. X-ray, Synchrotron and Neutron Techniques. 4:452-457
ISSN:	1819-7094 1027-4510
DOI:	10.1134/s1027451010030158
Popis:	The approach to determination of the thickness and the refractive indices of dielectric films obtained in searching experiments is discussed. Experiments of this kind often exhibit unpredictable values of thickness and refractive indices of films. Nondestructive noncontact methods of spectrophotometry and ellipsometry not involving preliminary preparation of samples are applied. The approach to determination of the thickness and the refractive indices of films is illustrated by means of samples of silicon carbonitride films obtained on silicon substrates by plasma-chemical decomposition of gas-phase trimethyl(phenylamino)silane.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::33a731ac4ba0a3b8a300f8d39233885f https://doi.org/10.1134/s1027451010030158 Zobrazit plný text záznamu Full text from SpringerLink