Highly accurate etching of ridge‐waveguide directional couplers usinginsitureflectance monitoring and periodic multilayers

Autor:	John F. Klem, S. H Kravitz, Gregory A. Vawter, G. R. Hadley
Rok vydání:	1993
Předmět:	Coupling Materials science Fabrication Physics and Astronomy (miscellaneous) business.industry Photonic integrated circuit Integrated circuit Waveguide (optics) law.invention Optics Etching (microfabrication) law Power dividers and directional couplers Reactive-ion etching business
Zdroj:	Applied Physics Letters. 62:1-3
ISSN:	1077-3118 0003-6951
DOI:	10.1063/1.108805
Popis:	A novel periodic multilayer structure has been used in conjunction with in situ reflectance monitoring to give ±10 nm endpoint detection during reactive‐ion‐beam etching. The method has been used to fabricate ridge‐waveguide directional couplers in GaAs/AlGaAs having coupling lengths within 100 μm of the desired 650 μm value. The added loss due to coupling length error was only 0.3 dB per guide. The method is directly applicable to photonic integrated circuits employing complex optical routing of waveguides, directional couplers and y‐junctions where total height of the waveguide plays a key role in performance of the circuit.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::32ccee524dc2cdafc83af9aa30cd5f3c https://doi.org/10.1063/1.108805 Zobrazit plný text záznamu