Enhancement in hyper-numerical-aperture imaging through selective TM polarization

Autor:	Peng Xie, Jianming Zhou, Bruce W. Smith
Rok vydání:	2008
Předmět:	Single exposure Brewster's angle Materials science business.industry Photoresist Condensed Matter Physics Polarization (waves) Reflectivity Image contrast Numerical aperture symbols.namesake Optics symbols Antireflection coating Optoelectronics Electrical and Electronic Engineering business
Zdroj:	Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 26:2116-2120
ISSN:	1520-8567 1071-1023
Popis:	The degradation of projected images using TM polarization is not intrinsic because losses in image contrast can be recoverable. By controlling the photoresist/substrate interface reflectivity, high modulation for TM polarization can be maintained for angles approaching 90° in a photoresist. Although there is calculated loss of image contrast with increasing polarization angle using suppressed reflection (i.e., with an antireflection coating), the loss is not nearly as large when imaging over a reflective substrate. These results can potentially impact the design of illumination, possibly away from most recent TE-only schemes for oblique imaging angles and high numerical apertures (NA). Several cases of TM illumination are presented combined with tuned substrate reflectivity for 0.93NA, 1.20NA, and 1.35NA and compared to results using TE illumination. Additionally, a scheme for frequency doubling with a single TM polarized exposure is presented. Using a single exposure and selective TM polarization, the re...
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::324ec0b162bdc2b17688c4b05cb9b2b8 https://doi.org/10.1116/1.3002565 Zobrazit plný text záznamu