Density determination of focused-electron-beam-induced deposits with simple cantilever-based method

Autor:	Xavier Multone, Ivo Utke, J. Michler, Patrik Hoffmann, T. Bret, Vinzenz Friedli
Rok vydání:	2006
Předmět:	Cantilever Physics and Astronomy (miscellaneous) Vacuum deposition Chemistry Atom Analytical chemistry Cathode ray Molecule Thermal stability Electron Beam (structure)
Zdroj:	Applied Physics Letters. 88:031906
ISSN:	1077-3118 0003-6951
DOI:	10.1063/1.2158516
Popis:	Freestanding deposits are grown on a silicon cantilever from a precursor gas by an electron induced process. Deposit mass determination is performed with an atomic force microscopy setup, where the cantilever resonance frequency shift, resulting from mechanical removal of the deposit, is measured. Deposits from hexafluoroacetylacetonato–Cu(I)–vinyltrimethylsilane show densities ranging from 2.05±0.45 to 3.75±0.55g∕cm3. Deposits from tetramethoxysilane have a constant density of (1.9±0.3)g∕cm3. Densities of deposits from Co2(CO)8 and [RhCl(PF3)2]2 are linearly related to their composition. The ratio of impinging electrons per deposited atom, beam heating, and thermal stability of the precursor molecule determine the density and composition in focused-electron-beam-induced deposits.
Databáze:	OpenAIRE
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