| Autor: |
Jeong Woo Park, Jong Rak Park, Young Bin Kim, Sang Hwa Jeong, Jong Tye Kim, Dong Gyu Ahn |
| Rok vydání: |
2012 |
| Předmět: |
|
| Zdroj: |
Journal of manufacturing engineering & technology. 21:246-251 |
| ISSN: |
2233-6036 |
| Popis: |
Pulse electrochemical polishing process has been used to improve mechanical properties such as surface roughness and corrosion resistance on conductive metallic materials. In addition, pulse electrochemical polishing process with various frequency may produce a lustrous, smoother, deburred and cleaned surface on workpiece. The aim of this paper is to study surface characteristics of pulse electrochemical polishing for various frequency conditions using AFM to verify localized surface variation in nanometer scale. |
| Databáze: |
OpenAIRE |
| Externí odkaz: |
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