Defect Formation under Nitrogen-Ion Implantation and Subsequent Annealing in GaAs Structures with an Uncovered Surface and a Surface Covered with an AlN Film
| Autor: | E. I. Shek, E. V. Fomin, A. E. Kalyadin, K. V. Karabeshkin, A. D. Bondarev, E. V. Sherstnev, V. I. Sakharov, N. A. Sobolev, V. M. Mikoushkin, I. T. Serenkov |
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| Rok vydání: | 2019 |
| Předmět: |
010302 applied physics
Materials science Annealing (metallurgy) Analytical chemistry chemistry.chemical_element 02 engineering and technology 021001 nanoscience & nanotechnology Condensed Matter Physics Epitaxy 01 natural sciences Nitrogen Crystallographic defect Atomic and Molecular Physics and Optics Spectral line Electronic Optical and Magnetic Materials Ion Condensed Matter::Materials Science Ion implantation chemistry Physics::Plasma Physics Sputtering 0103 physical sciences 0210 nano-technology |
| Zdroj: | Semiconductors. 53:415-418 |
| ISSN: | 1090-6479 1063-7826 |
| DOI: | 10.1134/s1063782619040250 |
| Popis: | The concentration profiles of defects produced in structures upon the implantation of nitrogen ions into GaAs epitaxial layers with an uncovered surface and that covered with an AlN film and subsequent annealing are studied. The ion energies and the implantation doses are chosen so that the nitrogen-atom concentration profiles coincided in structures of both types. Rutherford proton backscattering spectra are measured in the random and channeling modes, and the concentration profiles of point defects formed are calculated for the samples under study. It is found that the implantation of nitrogen ions introduces nearly the same number of point defects into structures of both types, and the formation of an AlN film by ion-plasma sputtering is accompanied by the formation of an additional number of defects. However, the annealing of structures of both types leads to nearly the same concentrations of residual defects. |
| Databáze: | OpenAIRE |
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