In Situ Quadrupole Mass Spectrometry and Quartz Crystal Microbalance Studies on the Atomic Layer Deposition of Titanium Dioxide from Titanium Tetrachloride and Water
Autor: | Mikko Ritala, Raija Matero, and Antti Rahtu |
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Rok vydání: | 2001 |
Předmět: | |
Zdroj: | Chemistry of Materials. 13:4506-4511 |
ISSN: | 1520-5002 0897-4756 |
Popis: | The atomic layer deposition (ALD) of TiO2 from TiCl4 and D2O at 150−400 °C was studied in situ with a quadrupole mass spectrometer (QMS) and a quartz crystal microbalance (QCM). The ALD growth proceeds via exchange reactions on the film surface. In the first step, TiCl4 is introduced on a surface covered with −OD groups which then become replaced with −O−TiClx species, and DCl is released as a volatile byproduct. In the second step, the incoming D2O reacts with the surface −Cl atoms replacing them with −OD groups and, again, DCl is released. When the temperature is increased from 150 to 250 °C, the number of −Cl ligands released during the TiCl4 pulse decreases from about two to one. At temperatures higher than 250 °C, less than one −Cl ligand is released, indicating molecular adsorption of TiCl4. |
Databáze: | OpenAIRE |
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