A novel approach to o‐nitrobenzyl photochemistry for resists

Autor:	C. W. Wilkins, Edwin Arthur Chandross, Elsa Reichmanis
Rok vydání:	1981
Předmět:	chemistry.chemical_compound Aqueous solution chemistry Resist Photosensitivity General Engineering Copolymer Alcohol Photochemistry Alkali metal
Zdroj:	Journal of Vacuum Science and Technology. 19:1338-1342
ISSN:	0022-5355
DOI:	10.1116/1.571272
Popis:	We have developed a two‐component (resin‐solution inhibitor) resist system having good photosensitivity in the 230–300 nm range. The resin is an optically transparent methyl methacrylate‐methacrylic acid copolymer that is soluble in aqueous alkali. The second component is one of a family of o‐nitrobenzyl carboxylates that are initially insoluble in the alkaline developer but are cleaved to soluble components upon irradiation. A number of o‐nitrobenzyl alcohol esters have been prepared and examined for use in this two‐component system. They have proven useful in the development of sensitive high‐resolution short‐wavelength photoresists which are described.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::31c19e7cd105e2b36b1638a76bf0fe38 https://doi.org/10.1116/1.571272 Zobrazit plný text záznamu