FTIR Plasma Phase Analysis of Hexamethyldisiloxane Discharge in Microwave Multipolar Plasma at Different Electrical Powers

Autor:	Patrice Raynaud, Yvan Segui, Hubert Caquineau, Bernard Despax
Rok vydání:	2005
Předmět:	Hexamethyldisiloxane chemistry.chemical_compound Polymers and Plastics Chemistry Analytical chemistry Plasma Fourier transform infrared spectroscopy Thin film Condensed Matter Physics Branching (polymer chemistry) Decomposition Microwave Ion source
Zdroj:	Plasma Processes and Polymers. 2:45-52
ISSN:	1612-8869 1612-8850
DOI:	10.1002/ppap.200400034
Popis:	In this paper, the gas phase composition of hexamethyldisiloxane (HMDSO) microwave plasma at 4 × 10 - 3 mbar and of the corresponding films were studied by FTIR spectroscopy under different power conditions. At low powers, species with a chemical structure very similar to that of HMDSO were observed in the gas phase, whereas the film essentially contained short -[(CH 3 ) 2 SiO] n -like chains with a low branching rate and the end group -Si(CH 3 ) 3 . At higher powers, the chemical entities present in the gas phase contained several -(Si-O) x - bonds, whereas the branching rate in the film increased with the amount of Si-H, Si-C and Si-O bonds. The interpretation of these observations led to a proposal involving a chemical mechanism. In this mechanism, the increasing decomposition of HMDSO into byproducts, which themselves increasingly decompose as the power is raised, plays a determining role.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::31bece13ea5c721ac85e64c401ce0a30 https://doi.org/10.1002/ppap.200400034 Zobrazit plný text záznamu Plný text