Polishing of YBa2Cu3O7−yby He‐ion etching

Autor:	Toshio Shima, Takashi Sudo, Noriyuki Inoue, Yasuo Takahashi, Kageyoshi Sakamoto, Yoshitake Nishi
Rok vydání:	1992
Předmět:	High-temperature superconductivity Materials science Inorganic chemistry General Physics and Astronomy Polishing Surface finish Isotropic etching law.invention Etching (microfabrication) law Surface roughness Dry etching Composite material Reactive-ion etching
Zdroj:	Journal of Applied Physics. 71:347-349
ISSN:	1089-7550 0021-8979
Popis:	Clean polishing is performed by helium‐ion etching on a surface of high‐Tc YBa2Cu3O7−y. Based on a knock‐on cascade model, the decrease of surface roughness is discussed. A rate process of etching is applied for the surface roughness of the high‐Tc YBa2Cu3O7−y.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::319337adb19a54b8946276fadda7380d https://doi.org/10.1063/1.350713 Zobrazit plný text záznamu