Autor: |
Francis Maury, Patrick Cassoux, P Bonnefond, Benoît Chansou, A Reynes, R Feurer, Robert Choukroun |
Rok vydání: |
1998 |
Předmět: |
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Zdroj: |
Annales de Chimie Science des Matériaux. 23:667-679 |
ISSN: |
0151-9107 |
DOI: |
10.1016/s0151-9107(99)80015-4 |
Popis: |
Both NMR identification of the decomposition by-products of the organometallic compounds M(NEt2)4 (M = V, Cr) and on line mass spectrometry analyses in the MOCVD reactor have been used, in relation with the main features of the films, to discuss a decomposition pathway which accounts for the lability of the NEt2 ligands and accordingly the low nitrogen content of the films. |
Databáze: |
OpenAIRE |
Externí odkaz: |
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