Stress Development during the Reactive Formation of Silicide Films

Autor:	François M. d'Heurle, Patrice Gergaud, Olivier Thomas, Christian Rivero
Rok vydání:	2005
Předmět:	Stress (mechanics) chemistry.chemical_compound Radiation Materials science Strain (chemistry) chemistry Reaction formation Silicide Relaxation (physics) General Materials Science Composite material Condensed Matter Physics
Zdroj:	Defect and Diffusion Forum. :801-812
ISSN:	1662-9507
DOI:	10.4028/www.scientific.net/ddf.237-240.801
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::31600df2d1c0fa0c8acac58507879e83 https://doi.org/10.4028/www.scientific.net/ddf.237-240.801 Zobrazit plný text záznamu